Solitec 5110 Spinner/Developer
• Acceleration control from 1KRPM to 40 RPM/sec
• Substrate size can range from 0.5” to 6” (9" for developer) diameter
• Developer - 5 function controller; prewet cycle, developer cycle, developer rinse and develop cycle, DI rinse, and spin dry with or without nitrogen
Standard Resists Available in Nanofabrication Lab
- Microchem SU 8 2010 Negative Photoresist
- Microchem SU 8 2050 Negative Photoresist
- Microchem SU 8 3005 Negative Photoresist
- Microchem KMPR 1025 Photoresist
- Micro Resist ma-N 2403 Negative Photoresist
- Shipley S1827 and S1805 Positive Photoresists
- ZEP 520A E-beam resist
- Microchem 950 PMMA A8 resist
- Microchem 950 PMMA A4 resist
- Microchem 950 PMMA A2 resist
- Microchem 495 PMMA A8 resist
- Microchem MMA 8.5 MAA EL9 Copolymer resist
- Microchem LOR 5A Resist
- Microchem OmniCoat
- ARC iCon7 Anti-Reflective Coating
Standard Developers Available in Nanofabrication Lab
- Microposit 351 Developer
- Microposit MF-319 Developer
- PMMA & Copolymer Developer MIBK/IPA 1:3
- PMMA & Copolymer Developer MIBK/IPA 1:2
- Microchem SU-8 Developer
- Microposit MF CD-26 Developer
- ZED - N50 Developer
