Title: Professor Emeritus
Office: Rm 20 ChB
Labs: 062, 004, 009, 010, 012 & 013 Chb & 13, 26 PAB
Phone (Office): 519-661-4180
Nanoscale Surface, Materials and Interface Science
Ph.D. (University of Nottingham, UK)
Research in our group Interface Science Western (ISW) is very broad and a more detailed description can be found on the ISW web page listed below.
Nanoscale Phenomena: A variety of nanoscale phenomena are under investigation using a range of probes such as AFM, IFM, STM, NSOM and confocal microscopies. These include: molecular basis of organometallic CVD; in-situ polymer film formation on semiconductor surfaces; creation of patterned nanoscale arrays on surfaces; nanoscale mechanical properties of materials and interfaces; friction, lubrication and wear (tribology); nanoscale mechanical properties of biological cells and biological cell signal transduction. Materials include polymers, cells, alloys, semiconductors, oxides. The goal is to understand the influence of interfaces and nanoscale structure on materials design and properties.
Surface Chemistry and Dynamics: The reactivity of surfaces is studied by a range of methods and new methods are continually being developed. These include microsecond time resolved IR of surface (UHV, electrochemical...) processes. Internal energy states of catalytic reaction products are being investigated.
A major theme of the group is the interaction of water and oxygen with surfaces of materials such as metals, alloys, semiconductors, polymers. Modification of the properties of polymer surfaces for biomaterials applications. An extensive program is underway looking at interfaces in organic light emitting diodes (OLED's).
Industrial and Other Interactions: The group works closely with industry on long-term projects relevant to industrial interests. Currently work is underway with Xerox, General Motors, Alcan, Mitsubishi. The group is associated with various Neworks: Materials and Manufacturing Ontario, Canadian Institute for Photonic Innovations and has recently received significant CFI funding.